EMS TURBO SPUTTER PDF

These products are for Research Use Only. Log files include date, time and process parameters. Intelligent system logic automatically detects which insert is in place and displays the appropriate operating settings and controls for that process. System prompts user to confirm target material and it then automatically selects appropriate parameters for that material. Intuitive software allows the most inexperienced or occasional operator to rapidly enter and store their own process data.

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Virr All are easy-change, drop-in style no screws and are height adjustable except for the rotary planetary stage. Including oscillator, feed-through, quartz dputter holder and one quartz crystal. Sputter current mA to a predetermined thickness with optional FTM or by the built-in timer. Fitted with three individual sputtering heads and a rotating specimen stag, it was rotary-pumped and suitable for non-oxidising metals.

The evaporation head is normally sputger for downwards evaporation, but for small specimens upward evaporation is possible using two terminal extensions supplied with the system. Consists of a built in chamber mounted quartz crystal oscillator includes crystal. Rotating vacuum spigot allows more convenient connection of the vacuum hose to the rear of the EMS R Plus when bench depth is limited.

E Automatic Sputter Coater. View Cart Request a Catalog. Intuitive software allows the most inexperienced or occasional operator to rapidly enter and store their own process data.

Full graphical interface with touch screen buttons. For reproducible high-quality carbon films, we would recommend the use of shaped carbon rods. Rods are higher purity, less susceptible to debris and easier to control. The EMS T D Plus uses low temperature enhanced-plasma magnetrons optimized for the turbomolecular pump pressures, combined with low current and deposition control, which ensures gurbo substrate is protected and uniformly coated.

The e-stop can be retrofitted to existing systems. The case houses all the working components and includes an automatic bleed control that ensures optimum vacuum conditions during sputtering. Stage rotation speed variable between preset limits. With the high-quality vacuum system the EMS T D Plus is also capable of using oxidizing metal targets such as chromium Cr and Aluminum Al to produce fine films and coatings.

Pulsed and ramped carbon rod recipes are supplied as standard. Sputter coating is a technique widely used in various applications; it is possible to create a plasma and sputter metals with high voltage, poor vacuum and no automation. Targets available from Quorum. Variable tilt angle, rotary planetary specimen stage, 50mm diameter rotational speed rpm.

Previous Sputter Coaters and Carbon Coaters Quorum Technologies All are easy-change, drop-in style no screws and are height adjustable except for the rotary planetary stage.

Please tick if you would wms to subscribe to our newsletter. Other stages available on request. Includes two spare quartz crystals.

High vacuum turbo pumping allows sputtering of a sputtrr range of oxidizing and non-oxidizing metals for thin film and electron microscopy applications. Software detects failure to achieve vacuum in a set period of time and shuts down the process in case of vacuum leak, which ensures pump protection from overheating. FTM-controlled version of the E Users can rapidly change the chamber, if necessary, to avoid cross contamination of sensitive samples.

Pioneering annular head sputter coater developed by Polaron. Rotation speed is variable from 14 rpm to 38 rpm. The platform has six positions for either 6. Dry pumping alternatives are also available. For alternative stages, see Ordering Information. Sun and planet-style stage with conductance film thickness monitor.

Film Thickness Monitor The deposition heads can be swapped in seconds and the intelligent system logic automatically recognizes which head is in place and displays the appropriate operating settings. Extended height vacuum chamber mm in height — the standard chamber is mm high. Supplied with pack of 10 tungsten specimen baskets. System prompts user to confirm target material and it then automatically selects appropriate parameters for that material.

Borosilicate glass mm ID x mm H. Quorum Technologies Instrument case mm W x mm D x mm H total height with coating head open: Country Please select spurter country The EMS T Plus sputetr uses low temperature enhanced-plasma magnetrons optimized for the rotary pump pressures, combined with low current and deposition control, which ensures your sample is protected and uniformly coated.

Full range, active vacuum gauge capable of measurement over the range of mbar to 5 x 10 -9 mbar. Allows multiple users to input and store coating recipes. R S and R ES versions only. Related Articles.

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These products are for Research Use Only. Log files include date, time and process parameters. Intelligent system logic automatically detects which insert is in place and displays the appropriate operating settings and controls for that process. System prompts user to confirm target material and it then automatically selects appropriate parameters for that material. Intuitive software allows the most inexperienced or occasional operator to rapidly enter and store their own process data. For convenience a number of typical sputtering and carbon coating profiles are already stored but also allows the user to create their own.

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EMS TURBO SPUTTER PDF

Douran For cleaning TEM apertures, a standard molybdenum boat supplied can be fitted. Automatic vacuum control which can be pre-programmed to suit the process and tturbo, therefore removing the need for manual intervention or control. Other stages available on request. Includes manual rod shaper and 3.

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The EMS T D Plus uses easy-change, 57 mm sputtre, disc-style targets which are designed to sputter oxidizing and noble metals. The EMS allows for carbon evaporation, metal evaporation from both baskets and crucibles and sputter coating option. Turbo-Pumped Sputter and Carbon Coater The platform has six specimen stub positions for 15 mm, 10 mm, 6. Tall chamber option is available for improved uniformity for sputtering and to hold larger substrates. Instrument case mm W x mm D x mm H total height with coating head open: Intelligent system logic automatically detects which insert is in place and displays the appropriate turob settings and controls eems that process. T S and T ES versions only.

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Virr All are easy-change, drop-in style no screws and are height adjustable except for the rotary planetary stage. Including oscillator, feed-through, quartz dputter holder and one quartz crystal. Sputter current mA to a predetermined thickness with optional FTM or by the built-in timer. Fitted with three individual sputtering heads and a rotating specimen stag, it was rotary-pumped and suitable for non-oxidising metals. The evaporation head is normally sputger for downwards evaporation, but for small specimens upward evaporation is possible using two terminal extensions supplied with the system. Consists of a built in chamber mounted quartz crystal oscillator includes crystal. Rotating vacuum spigot allows more convenient connection of the vacuum hose to the rear of the EMS R Plus when bench depth is limited.

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